: Includes over 100 calculated examples that illustrate how mask layouts transfer to actual device structures.
| Method | Key Steps | Practical Device | |--------|-----------|------------------| | | Deposit sacrificial oxide, pattern structural polysilicon, etch oxide to release moving parts. | Comb-drive accelerometer | | Bulk Micromachining | Anisotropic etching (KOH/TMAH) of silicon substrate to create deep cavities. | Pressure sensor membrane | | Deep Reactive Ion Etching (DRIE) | High-aspect-ratio vertical walls using Bosch process. | Gyroscope tuning forks | practical mems ville kaajakari pdf work